In the current plan, N+1 and N+2 processes will not use EUV equipment, until the equipment is ready, N+2 will turn to use EUV equipment.It is this statement.
If they developed a breakthrough without using EUV lithography and without American parts, why reverse course?
Usually with a breakthrough, you would keep going with it.
It took time and money to develop the breakthrough.
Now they going to tell the SMIC engineer to go back to trying to do it the old way?
If they had a breakthrough without using the EUV equipment, that should mean they were working on that. Now it is no more?
Of course we do not know what they exactly did. So it is possible.
Then again it could be reverse propaganda.
Long story making it short, my loud uneducated guess is that this is either one or two things.
1. An incremental breakthrough was made in this step and only this one step in the engineering of this node.
2. They built a better mouse trap.
Were they vague or clear on this work?
We will see.
Still good news.
