motif
06/07/2020, 03:45:18
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2021-2022. SSA800 is SMEE's new generation 28 nm immersion optical lithographic machine using DUV. In comparison, the current model SSA600 offered by SMEE is a 90 nm lithographic machine. Words are that the first machine may ship by the end of this year, capable of using ArF light source to fabricate 11 nm nodes with multiple exposure. This is perhaps for some sort of customer site field testing. The mass production will start next year based on official schedule. It has the potential to be used for 7 nm fabrication with multiple exposure. Although still behind ASML's EUV lithographic machine, work on indigenous EUV process are in progress. Keep in mind that ASML has currently monopolized the EUV category.
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